Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
Se Eun Kim, Ju Young Sung, Yewon Yun, Byeongjun Jeon, Sang Mo Moon, Han Bin Lee, Chae Hyun Lee, Hae Jun Jung, Jae‐Ung Lee, Sang Woon Lee, Jae‐Ung Lee, Jae‐Ung Lee, Sang Woon Lee
Topics & Concepts
DramCapacitorDynamic random-access memoryAtomic layer depositionMaterials scienceTransistorOptoelectronicsChemical vapor depositionNanotechnologyThin filmMetal-insulator-metalComputer scienceElectrical engineeringElectronic engineeringComputer hardwareEngineeringVoltageSemiconductor memorySemiconductor materials and devicesAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance Devices