An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
Ling‐Ya Tseng, Yan‐Cheng Lin, Chih‐Cheng Kuo, Chi‐Ching Kuo, Chi-Ching Kuo, Chi-Ching Kuo, Mitsuru Ueda, Wen‐Chang Chen
Topics & Concepts
PhotoresistTetramethylammonium hydroxideMaterials scienceBPDAPolyimideThermal stabilityScanning electron microscopeMicroelectronicsAqueous solutionChemical engineeringPolymer chemistryComposite materialChemistryNanotechnologyOrganic chemistryLayer (electronics)EngineeringSynthesis and properties of polymersEpoxy Resin Curing ProcessesOrganic Electronics and Photovoltaics