Structure and optical properties of HfO2 nano films grown by PLD for optoelectronic device
Shams Basel, Najwan H. Numan, Farah G. Khalid, Makram A. Fakhri
Abstract
The high purity and good transparent conductive nano and micro hafnium oxide (HfO2) films were deposited successfully using the pulsed laser deposition (PLD) method. The optical result shows a high transparency reached to (93) %. The value of the optical band gab of the deposited films at the optimum preparation condition is about 5.3eV, the surface morphology give a uniforms structure with the average roughness of (0.3 nm).
Topics & Concepts
Materials sciencePulsed laser depositionOptoelectronicsSurface roughnessNano-Optical transparencyTransparency (behavior)Transparent conducting filmThin filmSurface finishDeposition (geology)NanotechnologyComposite materialComputer scienceComputer securityPaleontologyBiologySedimentSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure AnalysisAdvancements in Semiconductor Devices and Circuit Design