Influence of 100 MeV <sup>16</sup> O <sup>7+</sup> ion irradiation on the structural, morphological, dielectric, and electromagnetic interference shielding properties of ferroelectric PVDF polymer
Santhoshkumar Dani, Arshad Ayub Hasamkal, Ramcharan Meena, Pravin Kumar, A. Tripathi, U. V. Khadke
Abstract
Polyvinylidene fluoride (PVDF), with β polymorph, is a versatile ferroelectric polymer in device fabrication. Its flexibility, lightweight, and ease of fabrication make it an alternative for electromagnetic interference shielding effectiveness (EMI-SE) improved through swift heavy ion (SHI) irradiation. For the first time, we modified PVDF thin films for EMI-SE applications, exposing them to a 100 MeV oxygen ion beam at varying fluencies. Our analysis encompassed investigating structural study, bonding interactions, surface morphology, and elemental analysis using X-ray diffraction (XRD), Fourier transform infrared spectrophotometry (FTIR), and Field Effect Scanning Electron Microscopy (FESEM) with Energy Dispersive X-ray Spectroscopy (EDS) respectively. Further, we measured dielectric response, cole-cole plot and EMI-SE in Ku-band (12–18 GHz) region using a vector network analyzer (VNA). The results revealed distinctive variations due to the deposition of 100 MeV oxygen ion beams, emphasizing the significant potential of irradiated PVDF thin films for EMI-SE applications. This study contributes to understanding the transformative impact of ion beam exposure on PVDF thin films and highlights their practical promise in emerging technological applications, particularly in EMI-SE.