Single crystal silicon wafer polishing by pretreating pad adsorbing SiO2 grains and abrasive-free slurries
Zhengzheng Bu, Fengli Niu, Jiapeng Chen, Zhenlin Jiang, Wenjun Wang, Xuehan Wang, Hanqiang Wang, Zefang Zhang, Yongwei Zhu, Tao Sun
Topics & Concepts
PolishingWaferAbrasiveMaterials scienceSlurryPotassium silicatePotassium hydroxideChemical-mechanical planarizationColloidal silicaSiliconPotassium carbonateMetallurgyCrystal (programming language)Composite materialChemical engineeringSodium silicateNanotechnologyChemistryEngineeringProgramming languageCoatingOrganic chemistryComputer scienceAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications