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Optimum Carbon Concentration in GaN-on-Silicon for Breakdown Enhancement in AlGaN/GaN HEMTs

Nayana Remesh, Nagaboopathy Mohan, Srinivasan Raghavan, R. Muralidharan, Digbijoy N. Nath

2020IEEE Transactions on Electron Devices41 citationsDOI

Abstract

This article reports on the experimental and analytical determination of the optimum carbon concentration in GaN to achieve enhanced breakdown in AlGaN/GaN high-electron mobility transistors (HEMTs). The lateral breakdown voltage increases when carbon doping is increased from <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3\times 10^{{18}}$ </tex-math></inline-formula> to 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">19</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−3</sup> beyond which it decreases, whereas there is no substantial enhancement in the vertical breakdown voltage with carbon doping. We invoke carrier statistics in a compensated semiconductor vis-à-vis the formation energy of carbon-occupying Ga (or N) vacancies to explain the observed buffer leakage. Temperature-dependent data indicate that the buffer leakage current is due to hopping transport, the activation energy of which yields the positions of the defect states within the bandgap. The increase in buffer leakage beyond optimum C concentration is attributed to the formation of shallow donor traps by carbon atoms occupying Ga vacancies (C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">Ga</sub> ). The observations correlated with the relative intensities of the defect-mediated peaks in the cathodoluminescence (CL) data of the samples. Based on our findings, a C doping beyond 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">19</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−3</sup> is not recommended for GaN buffers in order to achieve high breakdown voltages.

Topics & Concepts

Breakdown voltageDopingLeakage (economics)Materials scienceBand gapHigh-electron-mobility transistorOptoelectronicsAnalytical Chemistry (journal)SiliconTransistorPhysicsChemistryVoltageOrganic chemistryQuantum mechanicsEconomicsMacroeconomicsGaN-based semiconductor devices and materialsGa2O3 and related materialsZnO doping and properties
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