Flexible, Transparent, and Wafer‐Scale Artificial Synapse Array Based on TiO<sub><i>x</i></sub>/Ti<sub>3</sub>C<sub>2</sub>T<sub><i>x</i></sub> Film for Neuromorphic Computing
Junhua Huang, Shaodian Yang, Xin Tang, Leilei Yang, Wenjun Chen, Zibo Chen, Xinming Li, Zhiping Zeng, Zikang Tang, Xuchun Gui
Abstract
Abstract A high‐density neuromorphic computing memristor array based on 2D materials paves the way for next‐generation information‐processing components and in‐memory computing systems. However, the traditional 2D‐materials‐based memristor devices suffer from poor flexibility and opacity, which hinders the application of memristors in flexible electronics. Here, a flexible artificial synapse array based on TiO x /Ti 3 C 2 T x film is fabricated by a convenient and energy‐efficient solution‐processing technique, which realizes high transmittance (≈90%) and oxidation resistance (>30 days). The TiO x /Ti 3 C 2 T x memristor shows low device‐to‐device variability, long memory retention and endurance, a high ON/OFF ratio, and fundamental synaptic behavior. Furthermore, satisfactory flexibility ( R = 1.0 mm) and mechanical endurance (10 4 bending cycles) of the TiO x /Ti 3 C 2 T x memristor are achieved, which is superior to other film memristors prepared by chemical vapor deposition. In addition, high‐precision (>96.44%) MNIST handwritten digits recognition classification simulation indicates that the TiO x /Ti 3 C 2 T x artificial synapse array holds promise for future neuromorphic computing applications, and provides excellent high‐density neuron circuits for new flexible intelligent electronic equipment.