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145-MW/cm<sup>2</sup> Heteroepitaxial Diamond MOSFETs With NO<sub>2</sub> p-Type Doping and an Al<sub>2</sub>O<sub>3</sub> Passivation Layer

Niloy Chandra Saha, Toshiyuki Oishi, Seongwoo Kim, Yuki Kawamata, Koji Koyama, Makoto Kasu

2020IEEE Electron Device Letters29 citationsDOI

Abstract

In this study, we investigated diamond metal oxide semiconductor field effect transistors (MOSFETs) with NO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> p-type doping and Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> passivation layer fabricated on a high-quality heteroepitaxial single crystal (001) diamond substrate called Kenzan diamond <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">®</sup> . MOSFETs with a gate length of 1.4 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu \text{m}$ </tex-math></inline-formula> and nearly zero source-gate spacing exhibited a high drain current density of −776 mA/mm with a negligible gate leakage current ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$&lt; 0.1~\mu \text{A}$ </tex-math></inline-formula> /mm). MOSFETs with a gate-to-drain length of 4.8 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu \text{m}$ </tex-math></inline-formula> delivered a high off-state breakdown voltage (−618 V) at an average breakdown field of 1.2 MV/cm and a specific on-resistance of 2.63 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{m}\Omega \cdot $ </tex-math></inline-formula> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> . Baliga’s Figure-Of-Merits was calculated as 145 MW/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and the anticipated maximum power density was 12 W/mm. The diamond MOSFET was improved with high crystal quality.

Topics & Concepts

PassivationDopingDiamondPhysicsMaterials scienceAnalytical Chemistry (journal)OptoelectronicsNanotechnologyLayer (electronics)ChemistryOrganic chemistryComposite materialDiamond and Carbon-based Materials ResearchSemiconductor materials and devicesMetal and Thin Film Mechanics
145-MW/cm<sup>2</sup> Heteroepitaxial Diamond MOSFETs With NO<sub>2</sub> p-Type Doping and an Al<sub>2</sub>O<sub>3</sub> Passivation Layer | Litcius