Process influences on LeTID in Ga-doped silicon
Felix Maischner, Wolfram Kwapil, Johannes Greulich, Yujin Jung, Hannes Höffler, Pierre Saint‐Cast, Martin C. Schubert, Stefan Rein, Stefan W. Glunz
Topics & Concepts
DopingMaterials scienceSiliconPlasma-enhanced chemical vapor depositionDiffusionGalliumDegradation (telecommunications)Carrier lifetimeDielectricOptoelectronicsChemical engineeringAnalytical Chemistry (journal)ChemistryElectronic engineeringMetallurgyChromatographyPhysicsThermodynamicsEngineeringSilicon and Solar Cell TechnologiesThin-Film Transistor TechnologiesSemiconductor materials and interfaces