Recent developments in photoresists for extreme-ultraviolet lithography
Christopher K. Ober, Florian Käfer, Chenyun Yuan
Topics & Concepts
Extreme ultraviolet lithographyLithographyExtreme ultravioletResistNanotechnologyMaterials sciencePhotomaskNational laboratoryEngineering physicsOpticsPhysicsOptoelectronicsLaserLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis