The behaviors of He atoms and vacancies at TiO/V interface: A first-principles study
Jiteng Zhang, Na Jin, Lixian Lian, Zhinan Cao, Dengming Zhuang
Topics & Concepts
VanadiumNucleationVacancy defectAtom (system on chip)Materials scienceChemical physicsCluster (spacecraft)CrystallographyCrystal (programming language)ThermodynamicsChemistryMetallurgyPhysicsComputer scienceEmbedded systemProgramming languageNuclear Materials and PropertiesFusion materials and technologiesHigh-Temperature Coating Behaviors