Sputtering resistance and damage mechanism of Y2O3-based ceramics etching by Xe plasma
Yicheng Tan, Yong Wang, Shanghua Wu, Peng Chen, Zuoxiang Zhu, Zhuo Tian
Topics & Concepts
Materials scienceEtching (microfabrication)SputteringCeramicPlasma etchingX-ray photoelectron spectroscopyPlasmaYttriumReactive-ion etchingComposite materialSurface roughnessOxideAnalytical Chemistry (journal)Chemical engineeringMetallurgyNanotechnologyThin filmChemistryPhysicsChromatographyQuantum mechanicsLayer (electronics)EngineeringPlasma Diagnostics and ApplicationsSemiconductor materials and devicesMetal and Thin Film Mechanics