Defective UiO-66-NH<sub>2</sub> (Zr) for Simultaneous Adsorption of Phosphate and Pb<sup>2+</sup> for Hydrogen Peroxide Purification
Jingyu Cai, Jian Zhang, Junjie Shi, Hao Zhao, Yifeng Wei, Xiaoyu Miao, Kun‐Ching Shen, Rui Zhao, Longqiang Xiao, Linxi Hou
Abstract
Removal of hetero ions from the hydrogen peroxide solution is a crucial step in purifying electronic-grade H 2 O 2 . Conventional adsorption materials are challenged to meet the need for the simultaneous adsorption of both anions and cations in solvents. UiO-66 (Zr) modified by acetic acid and amino group for simultaneous adsorption of phosphate and Pb 2+ in H 2 O 2 purification was fabricated in this work. The as-prepared defective UiO-66-NH 2 (Zr) demonstrated a significant increase in specific surface area and porosity, along with more exposed sites for phosphate and Pb 2+ adsorption. The adsorption capacity of De-UiO-66-NH 2 for phosphate and Pb 2+ in H 2 O 2 solution was 52.28 mg g –1 and 35.4 mg g –1, which is 1.19 times and 1.88 times that of unmodified UiO-66 (Zr), respectively. The trace simultaneous adsorption with both 100 ppb phosphate and Pb 2+ showed removal rates of 94.0% and 88.7%, respectively, confirming the practicality of MOF materials in the purification of electronic chemicals. This work highlights the potential of Zr-based MOFs as anionic and cationic simultaneous adsorbents for highly efficient purification of electronic-grade solvents.