Surface stability of WN ultrathin films under O2 and H2O exposure: A first-principles study
Lokanath Patra, Govind Mallick, Ravindra Pandey, Shashi P. Karna
Topics & Concepts
Dissociation (chemistry)Materials scienceDensity functional theoryChemical physicsTungstenNitridePolarImpuritySurface energySurface modificationMolecular dynamicsNanotechnologyComposite materialComputational chemistryChemistryPhysical chemistryOrganic chemistryLayer (electronics)AstronomyMetallurgyPhysicsMetal and Thin Film MechanicsMXene and MAX Phase Materials