Contribution of EUV resist counting statistics to stochastic printing failures
William D. Hinsberg, Gregory M. Wallraff, Martha I. Sanchez, Nimrod Megiddo, Oleg Kostko
Abstract
Background: Stochastic printing failures, manifested as random defects in a patterned photoresist image, result from statistical fluctuations in photon flux and resist components and are a key issue confronting extreme ultraviolet (EUV) lithography. Empirical data indicate that photoresist composition and processing influence stochastic printing failure rates.
Topics & Concepts
PhotoresistResistExtreme ultraviolet lithographyLithographyExtreme ultravioletPhotolithographyStochastic processStochastic modellingComputer scienceProcess (computing)NanotechnologyMaterials scienceBiological systemOpticsStatisticsMathematicsPhysicsOptoelectronicsOperating systemLaserLayer (electronics)BiologyAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis