Effect and mechanism of oxidant on alkaline chemical mechanical polishing of gallium nitride thin films
Yebo Zhu, Xinhuan Niu, Ziyang Hou, Yinchan Zhang, Yunhui Shi, Ru Wang
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceX-ray photoelectron spectroscopyPolishingChemical engineeringSlurryChemical vapor depositionGallium nitrideSurface roughnessNanotechnologyMetallurgyComposite materialEngineeringLayer (electronics)Semiconductor materials and devicesAdvanced Surface Polishing TechniquesMetal and Thin Film Mechanics