Litcius/Paper detail

Cu-adherent poly(ether ether ketone) with low dielectric loss via self UV-initiated surface modification for high frequency application

Joon Hur, Bo-Young Kim, Myong Jae Yoo, Ji‐Hun Seo

2022Colloids and Surfaces A Physicochemical and Engineering Aspects17 citationsDOI

Topics & Concepts

PeekMaterials scienceGlycidyl methacrylateFourier transform infrared spectroscopyContact angleX-ray photoelectron spectroscopyComposite materialSurface modificationEtherDielectricDielectric lossPolymerizationGraftingPolymer chemistryChemical engineeringPolymerOrganic chemistryChemistryOptoelectronicsEngineeringSynthesis and properties of polymersSilicone and Siloxane ChemistryAdvanced Sensor and Energy Harvesting Materials
Cu-adherent poly(ether ether ketone) with low dielectric loss via self UV-initiated surface modification for high frequency application | Litcius