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Low resistance ohmic contact of multi-metallic Mo/Al/Au stack with ultra-wide bandgap Ga2O3 thin film with post-annealing and its in-depth interface studies for next-generation high-power devices

Shivani Shivani, Nipun Sharma, Mahesh Kumar, Mukesh Kumar, Mukesh Kumar, Mukesh Kumar

2024Surfaces and Interfaces15 citationsDOI

Topics & Concepts

Materials scienceOhmic contactAnnealing (glass)Thin filmContact resistanceOptoelectronicsStack (abstract data type)Band gapEngineering physicsNanotechnologyMetallurgyLayer (electronics)Computer scienceProgramming languageEngineeringGa2O3 and related materialsZnO doping and propertiesElectronic and Structural Properties of Oxides
Low resistance ohmic contact of multi-metallic Mo/Al/Au stack with ultra-wide bandgap Ga2O3 thin film with post-annealing and its in-depth interface studies for next-generation high-power devices | Litcius