Prediction of the surface roughness and material removal rate in chemical mechanical polishing of single-crystal SiC via a back-propagation neural network
Jiayun Deng, Qixiang Zhang, Jiabin Lu, Qiusheng Yan, Jisheng Pan, Run Chen
Topics & Concepts
PolishingAbrasiveChemical-mechanical planarizationMaterials scienceSurface roughnessParticle (ecology)Particle sizeSurface finishCrystal (programming language)Composite materialMetallurgyChemical engineeringComputer scienceEngineeringGeologyProgramming languageOceanographyAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationDiamond and Carbon-based Materials Research