Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices
Gyuyeon Han, J.C. Kim, Sanghyun Park, Won‐Gyu Bae
Abstract
Wide-Bandgap (WBG) semiconductors—silicon carbide (SiC) and gallium nitride (GaN)— enable high-power-density conversion, but performance is limited by where heat is generated and how it is removed. This review links device-level loss mechanisms (conduction and switching, including output-capacitance hysteresis and dynamic on-resistance) to structure-driven hot spots within the ultra-thin (tens of nanometers) two-dimensional electron gas (2DEG) channel of GaN HEMTs and to thermal boundary resistance at layer interfaces. We compare wire-bondless package concepts—double-sided cooling, embedded packaging, and interleaved planar layouts—and survey system-level cooling that shortens the conduction path and raises heat-transfer coefficients. The impact on reliability is discussed using temperature-sensitive electrical parameters (e.g., on-state VDS, threshold voltage, drain leakage, di/dt, and gate current) for real-time junction-temperature estimation and compact electro-thermal RC models for remaining-useful-life prediction. Evidence from recent literature points to interface resistance in GaN-on-SiC as a primary bottleneck, while near-junction cooling and advanced packages are effective mitigations. We argue for integrated co-design—devices, packaging, electromagnetic interference (EMI)-aware layout, and cooling—together with interface engineering and health monitoring to deliver reliable, high-density WBG systems.