Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Jayant K. Lodha, Ivan Pollentier, Thierry Conard, R. Vallat, Stefan De Gendt, Silvia Armini
Topics & Concepts
Extreme ultraviolet lithographyResistMonolayerAtomic layer depositionPhotoresistLithographyNanotechnologyPhotolithographyMaterials scienceLayer (electronics)Substrate (aquarium)FabricationDeposition (geology)Electron-beam lithographyOptoelectronicsGeologyAlternative medicinePathologyMedicinePaleontologyBiologyOceanographySedimentSemiconductor materials and devicesAdvancements in Photolithography TechniquesNanofabrication and Lithography Techniques