Effect of partial pressure of oxygen, target current, and annealing on DC sputtered tungsten oxide (WO3) thin films for electrochromic applications
K. Naveen Kumar, Sheik Abdul Sattar, Habibuddin Shaik, G.V. Ashok Reddy, R. Imran Jafri, Merum Dhananjaya, Amruth S. Pawar, Nunna Guru Prakash, R. Premkumar, Sabah Ansar, L. N. Chandrashekar, P. Aishwarya
Topics & Concepts
ElectrochromismAnalytical Chemistry (journal)Materials scienceThin filmAmorphous solidElectrochromic devicesPartial pressureAnnealing (glass)Raman spectroscopyTin oxideSputter depositionTungstenSputteringOxideOxygenChemistryNanotechnologyOpticsElectrodeMetallurgyCrystallographyPhysical chemistryOrganic chemistryChromatographyPhysicsTransition Metal Oxide NanomaterialsGas Sensing Nanomaterials and SensorsGa2O3 and related materials