Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications
K. Naveen Kumar, Habibuddin Shaik, Amulya Pawar, L. N. Chandrashekar, Sheik Abdul Sattar, G Nithya, R. Imran Jafri, V. Madhavi, Jyothi Gupta, G.V. Ashok Reddy
Topics & Concepts
ElectrochromismTungsten trioxideMaterials sciencePartial pressureAnnealing (glass)Thin filmAmorphous solidElectrochromic devicesTin oxideAnalytical Chemistry (journal)OxygenBand gapSputteringDopingTungstenTransmittanceOptoelectronicsMetallurgyNanotechnologyElectrodeChemistryCrystallographyPhysical chemistryChromatographyOrganic chemistryTransition Metal Oxide NanomaterialsGas Sensing Nanomaterials and SensorsConducting polymers and applications