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A methodology for mechanical stress and wafer warpage minimization during 3D NAND fabrication

Anastasiia Kruv, Mireia Bargalló González, Oguzhan Orkut Okudur, Valentina Spampinato, Alexis Franquet, Senthil Vadakupudhu Palayam, A. Arreghini, G. Van den bosch, M. Rosmeulen, Ingrid De Wolf

2021Microelectronic Engineering18 citationsDOI

Topics & Concepts

FabricationResidual stressWaferNAND gateMaterials scienceAnnealing (glass)LithographyStress (linguistics)Semiconductor device fabricationOptoelectronicsElectronic engineeringComposite materialLogic gateEngineeringAlternative medicineLinguisticsPathologyPhilosophyMedicineMetal and Thin Film MechanicsSemiconductor materials and devicesAdvanced Surface Polishing Techniques
A methodology for mechanical stress and wafer warpage minimization during 3D NAND fabrication | Litcius