Study on the interaction between SiO2 and ZrO2 in the chemical mechanical polishing of zirconia ceramic with colloidal silica
Sanwei Dai, Jifang Fu, Hong Lei, Yi Chen
Topics & Concepts
PolishingChemical-mechanical planarizationMaterials scienceCubic zirconiaDissolutionAbrasiveColloidal silicaChemical engineeringCeramicSlurryX-ray photoelectron spectroscopyZirconiumComposite materialMetallurgyEngineeringCoatingAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationDiamond and Carbon-based Materials Research