Reactivity of different nitriding agents with chlorine-terminated surface during atomic layer deposition of silicon nitride
Tirta Rona Mayangsari, Luchana L. Yusup, Romel Hidayat, Tanzia Chowdhury, Young‐Kyun Kwon, Won‐Jun Lee
Topics & Concepts
Atomic layer depositionChlorineNitridingSiliconSubstrate (aquarium)Silicon nitrideNitrideLayer (electronics)RadicalReactivity (psychology)PlasmaDeposition (geology)Materials scienceChemistryAnalytical Chemistry (journal)Inorganic chemistryNanotechnologyMetallurgyOrganic chemistryQuantum mechanicsBiologyAlternative medicineMedicinePhysicsGeologySedimentPathologyOceanographyPaleontologySemiconductor materials and devicesCatalytic Processes in Materials ScienceElectronic and Structural Properties of Oxides