On the low temperature limits for cryogenic etching: A quasi in situ XPS study
Felipe Cemin, Aurélie Girard, Christophe Cardinaud
Topics & Concepts
OverlayerX-ray photoelectron spectroscopyEtching (microfabrication)Analytical Chemistry (journal)Materials scienceWaferAdsorptionSiliconReactive-ion etchingBinding energyFermi levelChemistryLayer (electronics)Atomic physicsNanotechnologyPhysical chemistryChemical engineeringOptoelectronicsEngineeringChromatographyPhysicsElectronQuantum mechanicsSemiconductor materials and devicesElectron and X-Ray Spectroscopy TechniquesZnO doping and properties