Effect of etching time in hydrofluoric acid on the structure and morphology of n-type porous silicon
Martin Kopáni, Milan Mikula, Daniel Kosnáč, Jaroslav Kováč, Michal Trnka, Ján Greguš, Monika Jerigová, M. Jergel, Erik Vavrinský, Silvia Bačová, Peter Zitto, Štefan Polák, Emil Pinčík
Topics & Concepts
Hydrofluoric acidEtching (microfabrication)DissolutionPorous siliconMaterials scienceMorphology (biology)SiliconSurface finishChemical engineeringScanning electron microscopePorositySurface roughnessLayer (electronics)Amorphous solidMethanolAnalytical Chemistry (journal)CrystallographyChemistryNanotechnologyComposite materialOrganic chemistryMetallurgyEngineeringBiologyGeneticsSilicon Nanostructures and PhotoluminescenceNanowire Synthesis and ApplicationsSemiconductor materials and devices