High laser induced damage threshold photoresists for nano‐imprint and 3D multi‐photon lithography
Elmina Kabouraki, Vasileia Melissinaki, Amit Yadav, Andrius Melninkaitis, Konstantina Tourlouki, Theodoros Tachtsidis, N. Kehagias, Georgios D. Barmparis, D. G. Papazoglou, Edik U. Rafailov, Maria Farsari
Abstract
Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser‐induced damage threshold. These photoresists showed to be candidates for the fabrication of micro‐optical elements (MOEs) using three‐dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.