High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
Junqiu Liu, Guanhao Huang, Rui Ning Wang, Jijun He, Arslan S. Raja, Tianyi Liu, Nils J. Engelsen, Tobias J. Kippenberg
Abstract
For widespread applications of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, we present a CMOS fabrication technique for photonic microresonators with mean quality factors exceeding 30 millions and wafer-level yield.
Topics & Concepts
FabricationPhotonicsWaferMaterials sciencePhotonic integrated circuitElectronic circuitOptoelectronicsSilicon photonicsCMOSWafer-scale integrationDispersion (optics)Photonic crystalSilicon nitrideElectronic engineeringSiliconOpticsElectrical engineeringEngineeringPhysicsMedicineAlternative medicinePathologyAdvanced Fiber Laser TechnologiesPhotonic and Optical DevicesAdvanced Photonic Communication Systems