Radical inhibition in tomographic volumetric 3D printing for thiol-ene photoresists: From photorheology to printability
Quinten Thijssen, Antonio Jaén Ortega, Roniérik Pioli Vieira, Sandra Van Vlierberghe
Topics & Concepts
Ene reactionThiolMaterials scienceChemistryOrganic chemistryAdditive Manufacturing and 3D Printing TechnologiesSurface Roughness and Optical MeasurementsAdditive Manufacturing Materials and Processes