Cetyltrimethylammonium bromide reformed ceria nanocomposites of chemical mechanical planarization for silica wafers
You‒Sheng Lin, Kuen‒Song Lin, Wei‒Chin Tsai, Ndumiso Vukile Mdlovu, Cheng‒Yan Tang, U‒Ser Jeng, U‒Ser Jeng
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceTetraethyl orthosilicateScanning electron microscopeChemical engineeringDynamic light scatteringWaferZeta potentialFourier transform infrared spectroscopyPolishingAnalytical Chemistry (journal)NanoparticleComposite materialNanotechnologyChemistryOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesAdvanced Nanomaterials in CatalysisAnalytical chemistry methods development