Chemically grafted polyurethane/graphene ternary slurry for advanced chemical–mechanical polishing of single-crystalline SiC wafers
Hsien‐Kuang Liu, Chao‐Chang A. Chen, Ping-Chun Hsieh
Topics & Concepts
Materials scienceSlurryChemical-mechanical planarizationWaferPolyurethaneSurface roughnessPolishingX-ray photoelectron spectroscopyTernary operationAbrasiveOxideComposite materialGrapheneChemical engineeringGrindingNanotechnologyMetallurgyProgramming languageComputer scienceEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis