Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes
Adrien Toros, Marcell Kiss, Teodoro Graziosi, Sichen Mi, Riad Berrazouane, Mehdi Naamoun, Jelena Vukajlović Pleština, P. Gallo, Niels Quack
Abstract
• Review of the state of the art on reactive ion etching of single crystal diamond • In-depth analysis of diamond ICP RIE process parameters • Quantitative analysis of reported etch rates, selectivity and etch depths • Comprehensive catalog of diamond ICP RIE recipes providing selection guidelines
Topics & Concepts
DiamondReactive-ion etchingInductively coupled plasmaEtching (microfabrication)Materials scienceAnalytical Chemistry (journal)Single crystalIonNanotechnologyPlasmaOptoelectronicsChemistryCrystallographyMetallurgyEnvironmental chemistryPhysicsOrganic chemistryLayer (electronics)Quantum mechanicsDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsSemiconductor materials and devices