Improvement in performance of indium gallium oxide thin film transistor via oxygen mediated crystallization at a low temperature of 200 °C
Hyeong Jin Park, Taikyu Kim, Min Jae Kim, Hojae Lee, Jun Hyung Lim, Jae Kyeong Jeong
Topics & Concepts
Materials scienceBixbyiteThin-film transistorIndiumThreshold voltageGalliumOptoelectronicsThin filmCrystalliteTransistorNanotechnologyVoltageMetallurgyElectrical engineeringLayer (electronics)EngineeringThin-Film Transistor TechnologiesZnO doping and propertiesGa2O3 and related materials