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Mask design, fabrication, and experimental ghost imaging applications for patterned X-ray illumination

Alaleh Aminzadeh, Lindon Roberts, Benjamin Young, C. C. Chiang, Imants Svalbe, David M. Paganin, Andrew Kingston

2023Optics Express11 citationsDOIOpen Access PDF

Abstract

A set of non-configurable transversely-displaced masks has been designed and fabricated to generate high-quality X-ray illumination patterns for use in imaging techniques such as ghost imaging (GI), ghost projection, and speckle tracking. The designs include a range of random binary and orthogonal patterns, fabricated through a combination of photolithography and gold electroplating techniques. We experimentally demonstrated that a single wafer can be used as an illumination mask for GI, employing individual illumination patterns and also a mixture of patterns, using a laboratory X-ray source. The quality of the reconstructed X-ray ghost images has been characterized and evaluated through a range of metrics.

Topics & Concepts

OpticsPhotolithographyWaferMaterials scienceSpeckle patternGhost imagingFabricationImage qualityProjection (relational algebra)LithographyOptoelectronicsComputer sciencePhysicsArtificial intelligenceImage (mathematics)MedicinePathologyAlternative medicineAlgorithmRandom lasers and scattering mediaAdvanced Optical Imaging TechnologiesOrbital Angular Momentum in Optics
Mask design, fabrication, and experimental ghost imaging applications for patterned X-ray illumination | Litcius