Review of Si-Based GeSn CVD Growth and Optoelectronic Applications
Yuanhao Miao, Guilei Wang, Zhenzhen Kong, Buqing Xu, Xuewei Zhao, Xue Gang Luo, Hongxiao Lin, Yan Dong, Bin Lu, Linpeng Dong, Jiuren Zhou, Jinbiao Liu, Henry H. Radamson
Abstract
GeSn alloys have already attracted extensive attention due to their excellent properties and wide-ranging electronic and optoelectronic applications. Both theoretical and experimental results have shown that direct bandgap GeSn alloys are preferable for Si-based, high-efficiency light source applications. For the abovementioned purposes, molecular beam epitaxy (MBE), physical vapour deposition (PVD), and chemical vapor deposition (CVD) technologies have been extensively explored to grow high-quality GeSn alloys. However, CVD is the dominant growth method in the industry, and it is therefore more easily transferred. This review is focused on the recent progress in GeSn CVD growth (including ion implantation, in situ doping technology, and ohmic contacts), GeSn detectors, GeSn lasers, and GeSn transistors. These review results will provide huge advancements for the research and development of high-performance electronic and optoelectronic devices.