Numerical Study of SF6/O2 Plasma Discharge for Etching Applications
Banat Gul, Almas Gul, Aman‐ur Rehman, Iftikhar Ahmad
Topics & Concepts
PlasmaReactive-ion etchingChemistryPlasma etchingDissociation (chemistry)IonizationIonCapacitively coupled plasmaEtching (microfabrication)Analytical Chemistry (journal)Isotropic etchingSiliconArgonAtomic physicsPhysical chemistryInductively coupled plasmaLayer (electronics)Quantum mechanicsPhysicsOrganic chemistryChromatographyPlasma Diagnostics and ApplicationsSemiconductor materials and devicesElectrostatic Discharge in Electronics