Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field
Dong Hyun Kim, Seung Jae Kwak, Jae Hun Jeong, Suyoung Yoo, Sang Ki Nam, YongJoo Kim, Won Bo Lee
Abstract
etching process.
Topics & Concepts
ReaxFFMolecular dynamicsDissociation (chemistry)Force field (fiction)ChemistryMoleculeHydrogen bondComputational chemistryMaterials sciencePhysical chemistryOrganic chemistryInteratomic potentialArtificial intelligenceComputer sciencePlasma Diagnostics and ApplicationsSemiconductor materials and devicesNanowire Synthesis and Applications