Litcius/Paper detail

Nucleation and growth behavior of aluminum nitride film using thermal atomic layer deposition

Hee Ju Yun, Hogyoung Kim, Byung Joon Choi

2020Ceramics International30 citationsDOI

Topics & Concepts

NucleationMaterials scienceAtomic layer depositionSubstrate (aquarium)NitrideTinMolecular beam epitaxyChemical vapor depositionThin filmChemical engineeringLayer (electronics)NanotechnologyEpitaxyMetallurgyChemistryOrganic chemistryOceanographyEngineeringGeologySemiconductor materials and devicesGaN-based semiconductor devices and materialsAcoustic Wave Resonator Technologies
Nucleation and growth behavior of aluminum nitride film using thermal atomic layer deposition | Litcius