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Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques

Rui M. R. Pinto, Ved Gund, Carlos Calaza, K.K. Nagaraja, K. B. Vinayakumar

2022Microelectronic Engineering93 citationsDOI

Topics & Concepts

Dry etchingReactive-ion etchingMaterials scienceEtching (microfabrication)Microelectromechanical systemsPotassium hydroxideUndercutAmmonium hydroxideSurface roughnessNitrideSurface finishThin filmInductively coupled plasmaOptoelectronicsNanotechnologyComposite materialLayer (electronics)PlasmaChemical engineeringChemistryInorganic chemistryQuantum mechanicsEngineeringPhysicsAcoustic Wave Resonator TechnologiesGaN-based semiconductor devices and materialsFerroelectric and Piezoelectric Materials
Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques | Litcius