Polarisation-independent ultrafast laser selective etching processing in fused silica
Mario Ochoa, Pablo Roldán-Varona, José Francisco Algorri, José Miguel López Higuera, Luis Rodŕıguez-Cobo
Abstract
(4 hours in NaOH) including femtosecond-pulse energies corresponding to type II modifications. Few pulse inscriptions show a low degree of anisotropy as compared to higher number of pulses, thus enabling the polarisation insensitivity whose mechanisms are discussed. To demonstrate the capabilities of the processing, we fabricate curved and square-wave microchannels together with a complex 3D geometrical structure (stellated octahedron) containing an inter-plane arrangement with challenging angles (45°), which are difficult to achieve even employing dynamic polarisation control.
Topics & Concepts
Etching (microfabrication)FemtosecondLaserUltrashort pulseOpticsIsotropic etchingMaterials scienceAnisotropyPlanarPulse (music)PerpendicularOptoelectronicsNanotechnologyPhysicsGeometryComputer graphics (images)DetectorLayer (electronics)Computer scienceMathematicsLaser Material Processing TechniquesAdvanced Fiber Laser TechnologiesLaser-induced spectroscopy and plasma