Determination of corrosion product film on pure Mg in Cl<sup>−</sup> environment using XPS etching
Lingxiong Sun, Deqing Ma, Ye Liu, Qingwei Qin, Liang Liang, Hongbin Ma, Fuan Wei, Chao Zhang
Abstract
Abstract X-ray photoelectron spectroscopy (XPS) combined with Ar ion etching was used to analyse the surface film of pure Mg at different depth after immersion in 3.5 % NaCl solution for 10 min. The XPS spectra of specimen surface showed that the corrosion products are mainly made up of Mg(OH) 2 and Mg 2 Cl(OH) 3 · x H 2 O. The formation process of Mg 2 Cl(OH) 3 is the reaction of Mg(OH) 2 and Cl − and H + in weak acidic solutions. The XPS results indicated that the intensities of Mg 2 Cl(OH) 3 · x H 2 O decreased with the increase of etching time from 0 s to 4680 s. It is confirmed that the edge of Mg(OH) 2 protrudes outward and then splits into Mg 2 Cl(OH) 3 when Cl − attacks the Mg(OH) 2 films, so the Mg 2 Cl(OH) 3 attached to Mg(OH) 2 . Meanwhile, coupling the scanning electron microscope (SEM) and transmission electron microscopy (TEM) with the XPS to analyze the corrosion mechanism. Furthermore, the results displayed that the XPS combined with Ar ion etching is a good characterization method to understand the reaction of corrosion products.