In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma
Jordi Fraxedas, Max L. Schütte, Guillaume Sauthier, Massimo Tallarida, S. Ferrer, Vincent Carlino, E. Pellegrin
Topics & Concepts
SiliconX-ray photoelectron spectroscopyMaterials scienceTitaniumInductively coupled plasmaWaferPlasma cleaningSynchrotronUltra-high vacuumAnalytical Chemistry (journal)Band bendingThin filmPlasmaOptoelectronicsChemistryNanotechnologyOpticsMetallurgyChemical engineeringChromatographyEngineeringQuantum mechanicsPhysicsSemiconductor materials and devicesDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing Techniques