Influence of H2O2 on performance of corrosion inhibition of triazole derivatives for copper in alkaline chemical mechanical polishing slurry
Yuxin Wang, Zixuan Yan, Lei Dai, Daquan Zhang, Zhiling Xin, N. N. Andreev
Topics & Concepts
SlurryCorrosionPolishingCopperChemical-mechanical planarizationMetallurgyMaterials scienceTriazoleChemistryNuclear chemistryComposite materialOrganic chemistryAdvanced Surface Polishing TechniquesAdvanced Machining and Optimization TechniquesAdvanced materials and composites