Enhancing Performance of Dual-Gate FinFET with High-K Gate Dielectric Materials in 5 nm Technology: A Simulation Study
M. V. Ganeswara Rao, N. Ramanjaneyulu, Balamurali Pydi, Umamaheshwar Soma, K. Rajesh Babu, Satti Harichandra Prasad
Topics & Concepts
Materials scienceDielectricGate dielectricHigh-κ dielectricEquivalent oxide thicknessMetal gateOptoelectronicsElectric fieldGate oxideSilicon dioxideElectrical engineeringTransistorVoltagePhysicsComposite materialEngineeringQuantum mechanicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices