The influence of CeO2 abrasive size on the performance of photocatalytic assisted chemical-mechanical polishing by Y/Pr co-doping strategy
Ning Xu, Yuxin Luo, Yu Lin, Jiahui Ma, Yongping Pu
Topics & Concepts
AbrasiveMaterials sciencePhotocatalysisPolishingCerium oxideParticle sizeDopingSurface roughnessChemical engineeringCeriumChemical-mechanical planarizationQuartzComposite materialOxideMetallurgyCatalysisOptoelectronicsChemistryEngineeringBiochemistryAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchLaser-induced spectroscopy and plasma