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Insight into the mechanism of low friction and wear during the chemical mechanical polishing process of diamond: A reactive molecular dynamics simulation

Song Yuan, Xiaoguang Guo, Junxin Huang, Yonjun Gou, Zhuji Jin, Renke Kang, Dongming Guo

2020Tribology International73 citationsDOI

Topics & Concepts

PolishingAbrasiveDiamondChemical-mechanical planarizationMaterials scienceMolecular dynamicsMachiningMechanism (biology)Substrate (aquarium)SlurryFlow (mathematics)Composite materialMetallurgyMechanicsChemistryComputational chemistryGeologyPhysicsPhilosophyEpistemologyOceanographyAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications
Insight into the mechanism of low friction and wear during the chemical mechanical polishing process of diamond: A reactive molecular dynamics simulation | Litcius