Wafer-scale production of patterned transition metal ditelluride layers for two-dimensional metal–semiconductor contacts at the Schottky–Mott limit
Seunguk Song, Yeoseon Sim, Se‐Yang Kim, Jung Hwa Kim, Inseon Oh, Woongki Na, Do Hee Lee, Jaewon Wang, Shili Yan, Yinan Liu, Jinsung Kwak, Jianhao Chen, Hyeonsik Cheong, Jung‐Woo Yoo, Zonghoon Lee, Soon‐Yong Kwon
Topics & Concepts
SemiconductorMonolayerMaterials scienceSchottky barriervan der Waals forceTungsten disulfideMolybdenum disulfideTransition metalFermi levelSchottky diodeWaferNanotechnologyOptoelectronicsContact resistanceField-effect transistorCondensed matter physicsTransistorLayer (electronics)ChemistryMetallurgyElectrical engineeringDiodeCatalysisBiochemistryPhysicsQuantum mechanicsElectronVoltageMoleculeOrganic chemistryEngineering2D Materials and ApplicationsGraphene research and applicationsMXene and MAX Phase Materials