Experimental, DFT, and MD calculation study on chain amino acids promoting uniform corrosion for copper surface planarization
Jinxiang Huo, Baohong Gao, Bin He, wenhaoyu li, Yue He, Jian‐Shu Wang
Topics & Concepts
Chemical-mechanical planarizationCopperCorrosionChain (unit)ChemistrySurface (topology)MetallurgyMaterials scienceChemical engineeringComputational chemistryInorganic chemistryPolishingMathematicsPhysicsGeometryEngineeringAstronomyMetal and Thin Film MechanicsCopper Interconnects and ReliabilityCorrosion Behavior and Inhibition